JPH0441483B2 - - Google Patents

Info

Publication number
JPH0441483B2
JPH0441483B2 JP56022951A JP2295181A JPH0441483B2 JP H0441483 B2 JPH0441483 B2 JP H0441483B2 JP 56022951 A JP56022951 A JP 56022951A JP 2295181 A JP2295181 A JP 2295181A JP H0441483 B2 JPH0441483 B2 JP H0441483B2
Authority
JP
Japan
Prior art keywords
mark
reticle
wafer
light
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56022951A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57138134A (en
Inventor
Toshio Matsura
Kyoichi Suwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP56022951A priority Critical patent/JPS57138134A/ja
Publication of JPS57138134A publication Critical patent/JPS57138134A/ja
Priority to US06/586,639 priority patent/US4566795A/en
Publication of JPH0441483B2 publication Critical patent/JPH0441483B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP56022951A 1981-02-20 1981-02-20 Positioning device Granted JPS57138134A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP56022951A JPS57138134A (en) 1981-02-20 1981-02-20 Positioning device
US06/586,639 US4566795A (en) 1981-02-20 1984-03-06 Alignment apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56022951A JPS57138134A (en) 1981-02-20 1981-02-20 Positioning device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP62269194A Division JPS63153821A (ja) 1987-10-27 1987-10-27 位置合わせ装置

Publications (2)

Publication Number Publication Date
JPS57138134A JPS57138134A (en) 1982-08-26
JPH0441483B2 true JPH0441483B2 (en]) 1992-07-08

Family

ID=12096915

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56022951A Granted JPS57138134A (en) 1981-02-20 1981-02-20 Positioning device

Country Status (2)

Country Link
US (1) US4566795A (en])
JP (1) JPS57138134A (en])

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5950518A (ja) * 1982-09-01 1984-03-23 パ−キン−エルマ−・ツエンゾ−ル・アンシュタルト 投影プリント方法
JPS5972728A (ja) * 1982-10-20 1984-04-24 Canon Inc 自動整合装置
JPS5998525A (ja) * 1982-11-26 1984-06-06 Canon Inc 分割焼付け装置のアライメント方法
JPS59119411U (ja) * 1983-01-28 1984-08-11 日本電気ホームエレクトロニクス株式会社 投影露光装置
US4702606A (en) * 1984-06-01 1987-10-27 Nippon Kogaku K.K. Position detecting system
JPH0650389B2 (ja) * 1985-09-02 1994-06-29 株式会社ニコン マスク及び該マスクを用いる露光装置
US4769523A (en) * 1985-03-08 1988-09-06 Nippon Kogaku K.K. Laser processing apparatus
US4828392A (en) * 1985-03-13 1989-05-09 Matsushita Electric Industrial Co., Ltd. Exposure apparatus
JPS61236116A (ja) * 1985-04-12 1986-10-21 Hitachi Ltd 縮小投影式アライメント方法
US4771180A (en) * 1985-10-11 1988-09-13 Matsushita Electric Industrial Co. Ltd. Exposure apparatus including an optical system for aligning a reticle and a wafer
US4769551A (en) * 1986-06-27 1988-09-06 Nippon Kogaku K.K. Pattern detecting apparatus utilizing energy beam
US4697087A (en) * 1986-07-31 1987-09-29 The Perkin-Elmer Corporation Reverse dark field alignment system for scanning lithographic aligner
JP2773147B2 (ja) * 1988-08-19 1998-07-09 株式会社ニコン 露光装置の位置合わせ装置及び方法
US5734478A (en) * 1988-10-12 1998-03-31 Nikon Corporation Projection exposure apparatus
US5237389A (en) * 1990-01-31 1993-08-17 Fraunhofer Gesellschaft Zur Forderung Der Angewandten Forschung E.V. Device for measuring the positions and diameters of the filaments in a filament bundle
JP2897355B2 (ja) * 1990-07-05 1999-05-31 株式会社ニコン アライメント方法，露光装置，並びに位置検出方法及び装置
JPH08130180A (ja) * 1994-10-28 1996-05-21 Nikon Corp 露光方法
JP2715937B2 (ja) * 1994-11-07 1998-02-18 株式会社ニコン 露光方法
US5702567A (en) * 1995-06-01 1997-12-30 Kabushiki Kaisha Toshiba Plurality of photolithographic alignment marks with shape, size and spacing based on circuit pattern features
JPH10177245A (ja) * 1996-12-18 1998-06-30 Fujitsu Ltd レチクル、半導体基板及び半導体チップ
JP3548428B2 (ja) * 1998-07-03 2004-07-28 キヤノン株式会社 位置計測装置及びそれを用いたデバイスの製造方法
JP2003017386A (ja) * 2001-06-29 2003-01-17 Canon Inc 位置合わせ方法、露光方法、露光装置及びデバイスの製造方法
JP2004111500A (ja) * 2002-09-17 2004-04-08 Canon Inc マスク、露光装置及び方法
US20100058685A1 (en) * 2008-09-05 2010-03-11 International Business Machines Corporation Floor tile and air handling system using tile

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4408885A (en) * 1971-03-22 1983-10-11 Kasper Instruments, Inc. Apparatus for the automatic alignment of two superimposed objects, e.g. a semiconductor wafer and mask
JPS52109875A (en) * 1976-02-25 1977-09-14 Hitachi Ltd Position matching system for mask and wafer and its unit
JPS607764B2 (ja) * 1976-04-28 1985-02-27 キヤノン株式会社 走査型光検出装置
DE2633297A1 (de) * 1976-07-23 1978-01-26 Siemens Ag Verfahren zur automatischen justierung
DE2843282A1 (de) * 1977-10-05 1979-04-12 Canon Kk Fotoelektrische erfassungsvorrichtung
JPS5493974A (en) * 1978-01-06 1979-07-25 Hitachi Ltd Projection-system mask alignment unit
JPS55157230A (en) * 1979-05-28 1980-12-06 Hitachi Ltd Pattern position detector
JPS55162227A (en) * 1979-06-04 1980-12-17 Hitachi Ltd Microprojection exposure device
US4390279A (en) * 1979-07-12 1983-06-28 Nippon Kogaku K. K. Alignment device in an IC projection exposure apparatus
JPS5612727A (en) * 1979-07-12 1981-02-07 Nippon Kogaku Kk <Nikon> Aligning device for ic projection exposure apparatus
JPS5624504A (en) * 1979-08-06 1981-03-09 Canon Inc Photoelectric detector
US4277178A (en) * 1980-01-15 1981-07-07 Ford Aerospace & Communications Corp. Web element concentration detection system
US4362389A (en) * 1980-02-19 1982-12-07 Hitachi, Ltd. Method and apparatus for projection type mask alignment
JPS5719726A (en) * 1980-07-10 1982-02-02 Nippon Kogaku Kk <Nikon> Positioning device

Also Published As

Publication number Publication date
US4566795A (en) 1986-01-28
JPS57138134A (en) 1982-08-26

Similar Documents

Publication Publication Date Title
JPH0441483B2 (en])
US5184196A (en) Projection exposure apparatus
US5493402A (en) EGA alignment method using a plurality of weighting coefficients
JPH0445512A (ja) 投影露光装置及び方法
JP2002198303A (ja) 露光装置、光学特性計測方法、及びデバイス製造方法
US8625074B2 (en) Exposure apparatus and device fabrication method
US4614432A (en) Pattern detector
JPS6370104A (ja) 光学装置
JP2006184777A (ja) 焦点検出装置
JPH11297615A (ja) 投影露光装置および該装置を用いた半導体デバイスの製造方法
JP3117095B2 (ja) 投影光学系の検査方法
JP2007207822A (ja) 計測方法、露光方法、デバイス製造方法、計測用マーク、及びマスク
JPH0121615B2 (en])
JP3368266B2 (ja) 投影露光装置
JP2006053056A (ja) 位置計測方法、位置計測装置、露光装置、及びデバイス製造方法
JPH10172900A (ja) 露光装置
JP2004281904A (ja) 位置計測装置、露光装置、及びデバイス製造方法
JPH07321030A (ja) アライメント装置
JP3410013B2 (ja) 欠陥または異物の検査方法及びその装置
JP2004259815A (ja) 露光方法
JPH0677096B2 (ja) 投影装置の焦点合せ装置
JPH01209721A (ja) 投影露光装置
JP3368267B2 (ja) 投影露光装置
JPH0797545B2 (ja) 投影露光装置用の光学的位置合わせ装置
JPH0516649B2 (en])